ALEXANDRIA, Va., July 28 -- United States Patent no. 12,691,475, issued on July 28, was assigned to DENSO Corp. (Aichi, Japan) and HORIBA LTD. (Kyoto, Japan).

"Contaminant removal device and contaminant removal method" was invented by Takanori Nakamura (Aichi, Japan), Daisaku Sugi (Aichi, Japan), Daisuke Uki (Aichi, Japan), Takahiro Kawano (Aichi, Japan) and Toyoki Kanzaki (Kyoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "In order to obtain a contaminant removal device capable of improving contaminant removal performance regardless of a structure formed on a surface of an object, in the contaminant removal device, contaminant attached to the object is removed by a gas sprayed out of a nozzle havin...