US Patent Issued to Denka on March 17 for "Chloroprene polymer composition, manufacturing method therefor, and dip-molded article" (Japanese Inventors)

ALEXANDRIA, Va., March 17 -- United States Patent no. 12,577,381, issued on March 17, was assigned to Denka Co. Ltd. (Tokyo).

"Chloroprene polymer composition, manufacturing method therefor, and dip-molded article" was invented by Misaki Ito (Tokyo), Masao Onozuka (Tokyo) and Masahiro Kato (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for manufacturing a chloroprene polymer composition, the method including: a polymerization step of polymerizing chloroprene in the presence of at least one rosin acid component selected from the group consisting of a rosin acid and a rosin acid salt to obtain a chloroprene polymer composition containing a chloroprene polymer, in which in the rosin acid compone...