ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,772,391, issued on Oct. 20, was assigned to Delta Electronics (Shanghai) Co. Ltd. (Shanghai).
"Insulation structure and electronic device" was invented by Jianxing Dong (Shanghai), Lei Chen (Shanghai), Teng Liu (Shanghai) and Xiaohu Li (Shanghai).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present application provides an insulation structure and an electronic device, where the insulation structure includes a first substrate, a first conductive body, and a first groove, the first substrate includes a first surface and a second surface oppositely disposed; the first conductive body is disposed on the first surface or second surface; the first groove...