US Patent Issued to DEEPSYN. on July 14 for "High throughput method for constructing and screening compound library and reaction device" (Chinese Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,681,007, issued on July 14, was assigned to DEEPSYN. CO (Shanghai).

"High throughput method for constructing and screening compound library and reaction device" was invented by Jiajia Dong (Shanghai), Karl Barry Sharpless (Shanghai), Genyi Meng (Shanghai), Taijie Guo (Shanghai) and Tiancheng Ma (Shanghai).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention provides a high throughput method for constructing and screening a compound library and a reaction device. Specifically, the method of the present invention comprises: (a) providing a reactor comprising n independent and addressable reaction chambers; (b) performing m independent synth...