ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,239, issued on July 21, was assigned to DB HITEK Co. LTD. (Seoul, South Korea).

"Semiconductor device" was invented by Hong Sik Shin (Bucheon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device includes a channel region formed on a substrate, a source region formed on the channel region, a drain region formed on the channel region, a gate region formed on the channel region between the source region and the drain region, a source contact region formed on a portion of the source region, and a resistance region formed on another portion of the source region. The source contact region and the resistance region are elec...