ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,747,193, issued on Sept. 29, was assigned to DAIICHIKAGAKUKOGYOSHO Co. LTD. (Nara, Japan).
"Efflorescence removing chemical liquid" was invented by Minoru Aoki (Nara, Japan) and Eiichi Aoki (Nara, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "An efflorescence removing chemical liquid for dissolving and removing an efflorescence that is formed by calcium hydroxide dissolved by rainwater or groundwater, reacted with carbon dioxide gas in the air and adhered to an inside of a pipe, the efflorescence removing chemical liquid including: water; 10% or less of hydrochloric acid by weight with respect to the water; 3.6% or less of glycolic acid by weigh...