US Patent Issued to Daifuku on March 31 for "Abnormality locating system" (Japanese Inventors)

ALEXANDRIA, Va., March 31 -- United States Patent no. 12,591,023, issued on March 31, was assigned to Daifuku Co. Ltd. (Osaka, Japan).

"Abnormality locating system" was invented by Daisuke Ogawa (Hinocho, Japan), Ken Tokunaga (Hinocho, Japan), Masaki Hirano (Hinocho, Japan) and Akira Murota (Hinocho, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An abnormality locating system includes a display device, a controller, and a storage storing map data of a power feeder. The controller includes a distance information obtainer that obtains distance information indicating a distance from a power supply to a location of the abnormality, and an abnormality site display processor. The abnormality site display pr...