US Patent Issued to Dai Nippon Printing on Sept. 9 for "Mask group, method of manufacturing organic device and organic device" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 10 -- United States Patent no. 12,410,507, issued on Sept. 9, was assigned to Dai Nippon Printing Co. Ltd. (Tokyo).

"Mask group, method of manufacturing organic device and organic device" was invented by Yusuke Nakamura (Tokyo), Isao Miyatani (Tokyo), Naoki Nishimura (Tokyo) and Hiroshi Yano (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A mask group may include two or more masks. When a section in a normal direction is viewed, a region-defining straight line may be defined as a straight line that forms an angle Theta together with a first surface. The region-defining straight line may intersect the first surface at a first intersection point. An effective region may be defined ...