ALEXANDRIA, Va., Feb. 3 -- United States Patent no. 12,540,385, issued on Feb. 3, was assigned to Dai Nippon Printing Co. Ltd. (Tokyo).

"Production method for metal plates for vapor deposition masks" was invented by Chikao Ikenaga (Tokyo), Chiaki Hatsuta (Tokyo), Hiroki Oka (Tokyo), Sachiyo Matsuura (Tokyo), Hideyuki Okamoto (Tokyo) and Masato Ushikusa (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A metal plate used for manufacturing a deposition mask has a thickness of equal to or less than 30 micro metre. An average cross-sectional area of the crystals grains on a cross section of the metal plate is from 0.5 micro metre2 to 50 micro metre2. The average cross-sectional area of crystal grains is calc...