US Patent Issued to D2S on Sept. 9 for "Methods for modeling of a design in reticle enhancement technology" (California Inventor)

ALEXANDRIA, Va., Sept. 10 -- United States Patent no. 12,412,017, issued on Sept. 9, was assigned to D2S Inc. (San Jose, Calif.).

"Methods for modeling of a design in reticle enhancement technology" was invented by P. Jeffrey Ungar (Belmont, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods for reticle enhancement technology include inputting a target wafer pattern, the target wafer pattern spanning an entire design area, and iterating a proposed mask for the entire design area until the proposed mask meets criteria towards producing the target wafer pattern. Each iteration includes calculating a predicted wafer pattern from the proposed mask. The calculating comprises calculating a cost and deri...