US Patent Issued to D2S on June 16 for "Mask optimization accounting for more critical and less critical overlap regions" (California Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,656,675, issued on June 16, was assigned to D2S INC. (San Jose, Calif.).

"Mask optimization accounting for more critical and less critical overlap regions" was invented by Donald Oriordan (Sunnyvale, Calif.) and Akira Fujimura (Saratoga, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Some embodiments provide a method for optimizing a mask layout generated from a design layout of an IC. Based on an initial mask layout for a first layer, the method generates a simulated wafer image including shapes representing components of the first layer, including a first component that overlaps with a second component on a second layer. The method identifies a...