US Patent Issued to D2S on Dec. 2 for "Methods and systems to determine parasitics for semiconductor or flat panel display fabrication" (California Inventors)

ALEXANDRIA, Va., Dec. 2 -- United States Patent no. 12,488,175, issued on Dec. 2, was assigned to D2S INC. (San Jose, Calif.).

"Methods and systems to determine parasitics for semiconductor or flat panel display fabrication" was invented by Akira Fujimura (Saratoga, Calif.), Nagesh Shirali (San Jose, Calif.) and Donald Oriordan (Sunnyvale, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Some embodiments provide a method for calculating parasitic parameters for a pattern to be manufactured on an integrated circuit (IC) substrate. The method receives a definition of a wire structure as input. The method rasterizes the wire structure (e.g., produces pixel-based definition of the wire structure) to produce...