US Patent Issued to Cymer on Nov. 3 for "Passive dust trap, illumination system, and lithography system" (California Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,782,833, issued on Nov. 3, was assigned to Cymer LLC (San Diego).

"Passive dust trap, illumination system, and lithography system" was invented by Sean Marcus Buczek (San Diego) and Edward Siqi Luo (San Diego).

According to the abstract* released by the U.S. Patent & Trademark Office: "A system includes first and second sections. The first section includes an elongated plate including a squared edge, a tapered edge, a first surface, a second surface, and first and second extensions extending from the second surface. The second section includes first and second chambers with a dividing wall between the first and second chambers, the first chamber including a planar surface and the seco...