US Patent Issued to CSMC TECHNOLOGIES FAB2 on May 19 for "Single-photon avalanche diode integrated with quenching resistor and manufacturing method thereof" (Chinese Inventors)

ALEXANDRIA, Va., May 19 -- United States Patent no. 12,635,266, issued on May 19, was assigned to CSMC TECHNOLOGIES FAB2 Co. LTD. (Wuxi, China).

"Single-photon avalanche diode integrated with quenching resistor and manufacturing method thereof" was invented by Zheng Bian (Wuxi, China), Kui Xiao (Wuxi, China), Aifeng Zhao (Wuxi, China), Jinjie Hu (Wuxi, China) and Tao Yang (Wuxi, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure relates to a single-photon avalanche diode integrated with a quenching resistor and a manufacturing method thereof. The method includes: obtaining a wafer; patterning and etching a front surface of the base to form a quenching resistor trench and an isolation...