US Patent Issued to CORNING on Sept. 8 for "Methods for coating a substrate with magnesium fluoride via atomic layer deposition" (New York Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,729,431, issued on Sept. 8, was assigned to CORNING Inc. (Corning, N.Y.).

"Methods for coating a substrate with magnesium fluoride via atomic layer deposition" was invented by Ming-Huang Huang (Ithaca, N.Y.), Hoon Kim (Horseheads, N.Y.) and Jue Wang (Pittsford, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Atomic layer deposition methods for coating an optical substrate with magnesium fluoride. The methods include two primary processes. The first process includes the formation of a magnesium oxide layer over a surface of a substrate. The second process includes converting the magnesium oxide layer to a magnesium fluoride layer. These two primary p...