US Patent Issued to CORNING on Oct. 20 for "Flatness error resistant photomask measurement techniques" (New York Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,768,647, issued on Oct. 20, was assigned to CORNING Inc. (Corning, N.Y.).

"Flatness error resistant photomask measurement techniques" was invented by Thomas James Dunn (Penfield, N.Y.) and Steven James Van Kerkhove (Webster, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of determining a flatness of a substrate, the method including measuring a first flatness measurement of the substrate at a first orientation relative to a vertical direction, measuring a second flatness measurement of the substrate at a second orientation relative to the vertical direction, measuring a third flatness measurement of the substrate at a third orientation rel...