US Patent Issued to Commissariat a l'Energie Atomique et aux Energies Alternatives on Feb. 3 for "Method of manufacturing a photonic device" (French Inventors)

ALEXANDRIA, Va., Feb. 3 -- United States Patent no. 12,543,405, issued on Feb. 3, was assigned to Commissariat a l'Energie Atomique et aux Energies Alternatives (Paris).

"Method of manufacturing a photonic device" was invented by Margaux Audibert (Grenoble, France), Amelie Dussaigne (Grenoble, France) and Guillaume Veux (Grenoble, France).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of manufacturing a photonic device including the following steps: providing a structure including a base substrate covered by (Al,In,Ga)N/(Al,In,Ga)N mesas, a first mesa being fully porosified and having flanks covered by a protective layer, a second mesa being non-porosified, and a third mesa including porosified flank...