ALEXANDRIA, Va., Feb. 24 -- United States Patent no. 12,558,574, issued on Feb. 24, was assigned to COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES (Paris) and EDAP-TMS (Vaulx en Velin, France).
"Method and system for parameterising a high-intensity focused ultrasound treatment device" was invented by Sylvain Chatillon (Palaiseau, France), Michel Cardoso (Boulogne-Billancourt, France) and Nicolas Guillen (Fontaines sur Saone, France).
According to the abstract* released by the U.S. Patent & Trademark Office: "A parameterising method and system integrated within a high-intensity focused ultrasound (HIFU) treatment device. The parameterising system includes a real-time simulation unit that makes it possible to predict, on the...