US Patent Issued to CMC MATERIALS on July 14 for "Amine-based compositions for use in CMP with high polysilicon rate" (Illinois Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,679,997, issued on July 14, was assigned to CMC MATERIALS LLC (Aurora, Ill.).

"Amine-based compositions for use in CMP with high polysilicon rate" was invented by Julianne Truffa (Aurora, Ill.), Brittany Johnson (Aurora, Ill.), Alexander W. Hains (Aurora, Ill.), Elliot Knapton (Aurora, Ill.) and Brian Reiss (Aurora, Ill.).

According to the abstract* released by the U.S. Patent & Trademark Office: "The invention provides a chemical-mechanical polishing composition comprising: (a) silica abrasive; (b) an amine-based compound, wherein the amine-based compound comprises a carbon to nitrogen ratio of about 1:1 to about 3:1; (c) optionally a buffer; and (d) water, wherein the polishing com...