US Patent Issued to City Univerty of Hong Kong on May 5 for "Direct synthesis of improved superhydrophobic carbon nitride co-products, and improved superhydroppbic carbon nitride co-products thereof" (Chinese Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,617,682, issued on May 5, was assigned to City Univerty of Hong Kong (Hong Kong, Hong Kong).

"Direct synthesis of improved superhydrophobic carbon nitride co-products, and improved superhydroppbic carbon nitride co-products thereof" was invented by Thuc Hue Ly (Hong Kong, Hong Kong), Quoc Huy Thi (Hong Kong, Hong Kong) and Ping Man (Hong Kong, Hong Kong).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention is concerned with a method of direct synthesis of co-products of at a first co-product and a second co-product. The first co-product is superhydrophilic carbon nitride thin film and the second co-product is superhydrophilic carbon nitride...