US Patent Issued to Chitec Technology on July 28 for "Polymer structure and applications thereof" (Taiwanese Inventors)

ALEXANDRIA, Va., July 28 -- United States Patent no. 12,691,668, issued on July 28, was assigned to Chitec Technology Co. Ltd. (Taipei City, Taiwan).

"Polymer structure and applications thereof" was invented by Ching-Hao Cheng (Taipei City, Taiwan), Huang-Min Wu (Taipei City, Taiwan), Wei-Chun Chang (Taipei City, Taiwan), Yi-Shuo Huang (Taipei City, Taiwan), Chi-Feng Wu (Taipei City, Taiwan), De-Shun Luo (Taipei City, Taiwan), Si-Yuan Chen (Taipei City, Taiwan) and Yen-Hei Chiang (Taipei City, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A polymer structure and applications thereof are provided. The polymer structure includes a substrate and a light shielding layer covering at least a portion of the...