US Patent Issued to Chengdu BOE Optoelectronics Technology, BOE Technology Group on April 14 for "Mask, mask structure and method for manufacturing mask" (Chinese Inventors)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,601,041, issued on April 14, was assigned to Chengdu BOE Optoelectronics Technology Co. Ltd. (Chengdu, China) and BOE Technology Group Co. Ltd. (Beijing).

"Mask, mask structure and method for manufacturing mask" was invented by Dengjun Guo (Beijing), Junji Zhou (Beijing), Bowen Yang (Beijing), Wenchang Zhang (Beijing), Chao Ma (Beijing), Qingfeng Wu (Beijing), Xiaolong Luo (Beijing), Zhilin Du (Beijing), Yingdong Shi (Beijing), Shuowen Yi (Beijing) and Wenxu Lv (Beijing).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a mask, which includes: a mask body, including a plurality of grooves, wherein the plurality of grooves are distributed at int...