ALEXANDRIA, Va., Dec. 16 -- United States Patent no. 12,500,088, issued on Dec. 16, was assigned to CHEMPOWER Corp. (Beaverton, Ore.).
"Tools for chemical planarization" was invented by Sudhanshu Misra (Camas, Wash.) and Suryadevara Babu (Portland, Ore.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Examples are disclosed that relate to planarizing substrates without use of an abrasive. One example provides a method of chemically planarizing a substrate, the method comprising introducing an abrasive-free planarization solution onto a porous pad, contacting the substrate with the porous pad while moving the porous pad and substrate relative to one another such that higher portions of the substrate contact the...