US Patent Issued to CENTER FOR ADVANCED META-MATERIALS on Feb. 24 for "Photocatalytic facial mask and method for manufacturing the same" (South Korean Inventors)

ALEXANDRIA, Va., Feb. 24 -- United States Patent no. 12,557,860, issued on Feb. 24, was assigned to CENTER FOR ADVANCED META-MATERIALS (Daejeon, South Korea).

"Photocatalytic facial mask and method for manufacturing the same" was invented by Sueng-Mo Lee (Nonsan-si, South Korea), Bongkyun Jang (Daejeon, South Korea) and Jae-Hyun Kim (Daejeon, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "In a photocatalytic facial mask and a method for manufacturing the photocatalytic facial mask, the facial mask includes an inner layer, an outer layer, and a functional filter layer. The functional filter layer is disposed between the inner layer and the outer layer. The functional filter layer includes a photoa...