US Patent Issued to Carl Zeiss SMT on June 30 for "System and method for inspecting a mask for EUV lithography" (German Inventor)

ALEXANDRIA, Va., July 16 -- United States Patent no. 12,669,446, issued on June 30, was assigned to Carl Zeiss SMT GmbH (Oberkochen, Germany).

"System and method for inspecting a mask for EUV lithography" was invented by Renzo Capelli (Heidenheim, Germany).

According to the abstract* released by the U.S. Patent & Trademark Office: "A pre-classification of potential mask defects on the basis of machine learning is provided during the inspection of a mask for EUV lithography."

The patent was filed on Sept. 22, 2022, under Application No. 17/950,196.

*For further information, including images, charts and tables, please visit: http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=...