US Patent Issued to Carl Zeiss SMT on July 21 for "Optical system, test device, lithography apparatus, arrangement and method" (German Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,687,792, issued on July 21, was assigned to Carl Zeiss SMT GmbH (Oberkochen, Germany).

"Optical system, test device, lithography apparatus, arrangement and method" was invented by Stefan Krone (Ellwangen, Germany), Ralf Kiesel (Gaildorf, Germany), Volker Wieczorek (Neu-Ulm, Germany) and Kai Kunze (Schwaebisch Gmuend, Germany).

According to the abstract* released by the U.S. Patent & Trademark Office: "An optical system comprises a number of optics modules, wherein the respective optics module comprises: a number of displaceable optical elements for guiding radiation in the optical system; a number of actuator/sensor devices, wherein at least one of the actuator/sensor devices is assi...