US Patent Issued to Carl Zeiss SMT on Jan. 27 for "Method and apparatus for setting a side wall angle of a pattern element of a photolithographic mask" (German Inventors)

ALEXANDRIA, Va., Jan. 28 -- United States Patent no. 12,535,726, issued on Jan. 27, was assigned to Carl Zeiss SMT GmbH (Oberkochen, Germany).

"Method and apparatus for setting a side wall angle of a pattern element of a photolithographic mask" was invented by Daniel Rhinow (Frankfurt am Main, Germany), Joachim Welte (Darmstadt, Germany) and Markus Bauer (Schneckenlohe, Germany).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for setting at least one side wall angle of at least one pattern element of a photolithographic mask including the steps of: (a) providing at least one precursor gas; (b) providing at least one massive particle beam which induces a local chemical reaction of the at least one prec...