ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,547,080, issued on Feb. 10, was assigned to Carl Zeiss SMT GmbH (Oberkochen, Germany).
"Field facet system and lithography apparatus" was invented by Arno Schmittner (Aalen, Germany), Willi Anderl (Huettlingen, Germany), Ralf Ameling (Aalen, Germany), Stefan Lippoldt (Aalen, Germany), Joram Rosseels (Putte, Belgium) and Rob Wilhelmus Maria Janssen (Meerssen, Netherlands).
According to the abstract* released by the U.S. Patent & Trademark Office: "A field facet system for a lithography apparatus comprises: an optical element comprising a base body and an elastically deformable facet portion connected to the base body and having a light-reflecting optically active surface; and a plural...