ALEXANDRIA, Va., Aug. 5 -- United States Patent no. 12,699,330, issued on Aug. 4, was assigned to CARL ZEISS SMT GMBH (Oberkochen, Germany).
"Method for depositing a cover layer, EUV lithography system and optical element" was invented by Dirk Ehm (Beckingen, Germany), Moritz Becker (Aalen, Germany) and Stefan Schmidt (Mettlach, Germany).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method of depositing a cover layer onto an optical element (M1) for reflection of EUV radiation. In the method, a cover layer containing phosphorus (P) is deposited onto the optical element (M1). The optical element (M1) in the course of deposition of the cover layer (35) is disposed in an interior (39) of a housing (36) of an ...