US Patent Issued to CARBONCOMPETENCE, YG-1 on Aug. 25 for "Method for applying a doped diamond layer to a substrate by chemical vapour deposition" (Austrian Inventors)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,716,127, issued on Aug. 25, was assigned to CARBONCOMPETENCE GMBH (Wattens, Austria) and YG-1 Co. LTD. (Incheon, South Korea).

"Method for applying a doped diamond layer to a substrate by chemical vapour deposition" was invented by Detlef Steinmuller (Aldrans, Austria), Doris Steinmuller-Nethl (Aldrans, Austria) and Maximilian Steinmuller (Innsbruck, Austria).

According to the abstract* released by the U.S. Patent & Trademark Office: "A device (1) and a process for applying a doped diamond layer to a substrate (2, 2a) by chemical vapour deposition. The device (1) has a deposition chamber for holding the substrate (2, 2a), a gas activation element (7) in the form of a hollow body with...