ALEXANDRIA, Va., Dec. 2 -- United States Patent no. 12,486,560, issued on Dec. 2, was assigned to CANON TOKKI Corp. (Mitsuke, Japan).
"Alignment mechanism, alignment method, film forming device and film forming method" was invented by Shunsuke Okabe (Tokyo), Kentaro Suzuki (Tokyo), Taiichirou Aoki (Tokyo) and Yoshihiro Nakasu (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "The alignment mechanism of the present disclosure is configured to adjust positions of a substrate and a mask, the alignment mechanism being characterized by including a substrate suctioner configured to suction and hold the substrate; a mask supporter configured to support the mask; a temporary receiver configured to temporarily sup...