US Patent Issued to CANON on Sept. 1 for "Imprint system, substrate, imprint method, replica mold manufacturing method, and article manufacturing method" (Japanese Inventor)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,722,339, issued on Sept. 1, was assigned to CANON K.K. (Tokyo).

"Imprint system, substrate, imprint method, replica mold manufacturing method, and article manufacturing method" was invented by Hiroshi Sato (Tochigi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An imprint system transfers a pattern formed on a mold to an imprint material supplied onto a substrate and includes: a formation unit configured to form a desired substrate-side mark including a predetermined material by applying the predetermined material onto the surface of the substrate and then transferring the substrate-side mark on the predetermined material and processing the subst...