ALEXANDRIA, Va., Nov. 11 -- United States Patent no. 12,469,737, issued on Nov. 11, was assigned to CANON K.K. (Tokyo).
"Stage apparatus, lithography apparatus and article manufacturing method" was invented by Takahiro Sumi (Tokyo) and Shigeo Koya (Tochigi, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A stage apparatus for holding a substrate, including a substrate holding unit including a holding surface that holds the substrate, a driving mechanism configured to transfer the substrate to the holding surface, and a control unit configured to decide, based on warpage information concerning warpage of the substrate measured while the substrate is supported by a supporting surface smaller than the hold...