ALEXANDRIA, Va., March 3 -- United States Patent no. 12,566,371, issued on March 3, was assigned to CANON K.K. (Tokyo).

"Imprint device, imprint method, and article manufacturing method" was invented by Ryosuke Hamamoto (Tochigi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An imprint device that forms a pattern on a shot region of a substrate by using a mold is provided. The imprint device includes an irradiator configured to at least partially irradiate a pattern region of the mold with light, and a controller. The controller is configured to determine a partial region of the pattern region including a boundary between a first region including one or more recessed portions having a depth exceeding ...