US Patent Issued to CANON on March 3 for "Holding device, method of determining attraction abnormality in holding device, lithography apparatus, and method of manufacturing article" (Japanese Inventor)

ALEXANDRIA, Va., March 3 -- United States Patent no. 12,566,373, issued on March 3, was assigned to CANON K.K. (Tokyo).

"Holding device, method of determining attraction abnormality in holding device, lithography apparatus, and method of manufacturing article" was invented by Kohei Senshu (Saitama, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A holding device in a lithography apparatus for transferring a pattern formed on a mold to a substrate, for attracting/holding the mold or substrate by a reduced pressure, comprising: a holding unit holding the mold or substrate, having concave portions forming spaces together with the mold or substrate; a first pressure mechanism to depressurize at least one fi...