US Patent Issued to Canon on June 30 for "Method for improving accuracy of imprint force application in imprint lithography" (Texas Inventors)

ALEXANDRIA, Va., July 16 -- United States Patent no. 12,669,754, issued on June 30, was assigned to Canon K.K. (Tokyo).

"Method for improving accuracy of imprint force application in imprint lithography" was invented by Nilabh K. Roy (Austin, Texas) and Jeffrey Dean Klein (Austin, Texas).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for identifying a model for modeling cable stress relaxation dynamics of an imprint head is provided. The method includes performing a non-contact imprint test run for a predetermined number of wafers. Data from a force trace and a position trace of the imprint head during the non-contact imprint test run are collected to compute cable stress relaxation forces. A model h...