US Patent Issued to CANON on June 23 for "Exposure apparatus, exposure method, and article manufacturing method" (Japanese Inventor)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,731, issued on June 23, was assigned to CANON K.K. (Tokyo).

"Exposure apparatus, exposure method, and article manufacturing method" was invented by Junichi Motojima (Tochigi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An exposure apparatus for projecting a pattern of an original onto a substrate by a projection optical system, and exposing the substrate, is provided. The apparatus includes a stage configured to move while holding the substrate, a measurement device configured to perform, at a plurality of measurement points in an exposure region, measurement of a height position of the substrate held by the stage, and a controller configur...