US Patent Issued to CANON on June 2 for "Substrate processing apparatus, substrate processing method, and article manufacturing method" (Japanese Inventors)

ALEXANDRIA, Va., June 2 -- United States Patent no. 12,643,266, issued on June 2, was assigned to CANON K.K. (Tokyo).

"Substrate processing apparatus, substrate processing method, and article manufacturing method" was invented by Hiroki Takada (Saitama, Japan), Ken-Ichiro Shinoda (Tochigi, Japan) and Osamu Yasunobe (Tochigi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus that can radiate light on a composition in an optimum radiation amount based on acquired spectral sensitivity characteristics can be provided. A substrate processing apparatus configured to perform pattern formation processing on a composition on a substrate includes a first radiation unit configured to...