ALEXANDRIA, Va., June 16 -- United States Patent no. 12,654,387, issued on June 16, was assigned to CANON K.K. (Tokyo).
"Imprint apparatus, imprint method, and article manufacturing method" was invented by Fumiaki Kitayama (Tochigi, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "An imprint apparatus that forms a pattern of a curable composition on a substrate by using a mold, includes an alignment mechanism configured to perform alignment between a shot region of the substrate and a pattern region of the mold, a curing device configured to cure the curable composition between the shot region and the pattern region by irradiating the curable composition with light, and a controller configured to change ...