US Patent Issued to CANON on Feb. 3 for "Exposure apparatus, exposure method and article manufacturing method" (Japanese Inventors)

ALEXANDRIA, Va., Feb. 3 -- United States Patent no. 12,541,153, issued on Feb. 3, was assigned to CANON K.K. (Tokyo).

"Exposure apparatus, exposure method and article manufacturing method" was invented by Masaki Imai (Saitama, Japan) and Mamoru Kaneishi (Tochigi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An exposure apparatus for exposing a plurality of shot regions on a substrate, including a stage configured to hold and drive the substrate, and a control unit configured to control driving of the stage based on a driving profile that defines the driving of the stage, wherein the driving profile is formed by connecting a first acceleration profile that controls acceleration/deceleration of the sta...