ALEXANDRIA, Va., Feb. 24 -- United States Patent no. 12,560,875, issued on Feb. 24, was assigned to Canon K.K. (Tokyo).
"Exposure apparatus, image-forming apparatus and manufacturing method" was invented by Koichiro Nakanishi (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "An exposure apparatus includes: light-emitting chips arranged in a staggered manner along a reference line that is parallel to an axial direction of a photosensitive member, each of which has a silicon substrate and a light-emitting element array that is an array of organic electro luminescence (EL) elements formed on a first surface of the silicon substrate; and a rod lens array that images light from the light-emitting element arra...