US Patent Issued to CANON on April 7 for "Detection device, lithography apparatus, and article manufacturing method" (Japanese Inventors)

ALEXANDRIA, Va., April 7 -- United States Patent no. 12,596,310, issued on April 7, was assigned to CANON K.K. (Tokyo).

"Detection device, lithography apparatus, and article manufacturing method" was invented by Shun Toda (Tochigi, Japan), Toshiki Iwai (Saitama, Japan), Yasuyuki Unno (Tochigi, Japan) and Yuichi Fujita (Tochigi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Detection device detects relative position between first and second marks overlapping each other. The device includes illumination system configured to illuminate the first and second marks with illumination light, and detection system configured to form image on imaging surface of image sensor from diffracted lights from the first ...