ALEXANDRIA, Va., April 15 -- United States Patent no. 12,600,820, issued on April 14, was assigned to CANON K.K. (Tokyo).
"Photocurable composition with high silicon content" was invented by Fen Wan (Austin, Texas) and Weijun Liu (Cedar Park, Texas).
According to the abstract* released by the U.S. Patent & Trademark Office: "A photocurable composition can comprise a polymerizable material and a photoinitiator, wherein the polymerizable material may comprise at least one silicon-containing monomer having a structure of formula (1) with R1, R2: -O-Si(CH3)3, alkyl, aryl, or alkylaryl; R3, R4: -O-Si(CH3)3, alkyl, aryl, or alkylaryl; R5: C1-C5-alkyl, aryl, alkylaryl; R6: -R5-X, or X, or -O-Si(CH3)3, or alkyl, or aryl, or alkylaryl; X: acrylate...