ALEXANDRIA, Va., April 15 -- United States Patent no. 12,604,707, issued on April 14, was assigned to CANON K.K. (Tokyo).

"Method including positioning a source die or a destination site to compensate for overlay error" was invented by Byung-Jin Choi (Austin, Texas).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method can include bonding a first source die to a first destination site of a destination substrate, wherein the first source die includes a source metrology pattern including a source alignment mark, and the first destination site includes a destination metrology pattern including a destination alignment mark. The method can include collecting radiation data regarding the source and destination me...