ALEXANDRIA, Va., March 31 -- United States Patent no. 12,590,367, issued on March 31, was assigned to BENEQ OY (Espoo, Finland).

"Precursor supply chamber" was invented by Johannes Wesslin (Espoo, Finland), Matti Malila (Espoo, Finland) and Pekka Soininen (Espoo, Finland).

According to the abstract* released by the U.S. Patent & Trademark Office: "A precursor supply chamber for accommodating a precursor container in connection with an atomic layer deposition apparatus includes chamber walls defining a chamber space inside the precursor supply chamber. The precursor supply chamber also includes a chamber door assembly arranged to close the precursor supply chamber in a gas tight manner, a first heating element provided to the precursor sup...