US Patent Issued to BENEQ on Aug. 25 for "Precursor source arrangement and atomic layer deposition apparatus" (Finnish Inventors)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,716,130, issued on Aug. 25, was assigned to BENEQ OY (Espoo, Finland).

"Precursor source arrangement and atomic layer deposition apparatus" was invented by Hulda Aminoff (Espoo, Finland), Pekka Soininen (Espoo, Finland), Pekka J. Soininen (Espoo, Finland) and Ville Miikkulainen (Espoo, Finland).

According to the abstract* released by the U.S. Patent & Trademark Office: "A precursor source arrangement for an atomic layer deposition apparatus for receiving a liquid precursor container for liquid precursor. The precursor source arrangement includes a precursor container support arrangement arranged to hold the liquid precursor container in inclined position relative to vertical directio...