US Patent Issued to BEIJING NAURA MICROELECTRONICS EQUIPMENT on March 17 for "Gas injection device of semiconductor thermal processing equipment and semiconductor thermal processing equipment" (Chinese Inventor)

ALEXANDRIA, Va., March 17 -- United States Patent no. 12,577,669, issued on March 17, was assigned to BEIJING NAURA MICROELECTRONICS EQUIPMENT Co. LTD. (Beijing).

"Gas injection device of semiconductor thermal processing equipment and semiconductor thermal processing equipment" was invented by Liguang Lan (Beijing).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure provides a gas injection device of semiconductor thermal processing equipment and the semiconductor thermal processing equipment. The device includes an inlet pipe. A first pipe segment includes a first pipe wall and a second pipe wall embedded in the first pipe wall. A buffer space is formed between an inner wall of the first pi...