US Patent Issued to AUROS Technology on Sept. 8 for "Overlay measurement apparatus and overlay measurement method" (South Korean Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,730,079, issued on Sept. 8, was assigned to AUROS Technology Inc. (Hwaseong-si, South Korea).

"Overlay measurement apparatus and overlay measurement method" was invented by Seong Yun Choi (Osan-si, South Korea) and Sun Gyun Kim (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is a system for optimizing a measurement time of an overlay. According to one embodiment, an overlay measurement apparatus is provided. The overlay measurement apparatus includes a light source configured to direct light to a plurality of overlay targets formed on a wafer; a lens unit including: an objective lens and a lens focus actuator; a detector con...