ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,770,248, issued on Oct. 20, was assigned to AUROS Technology Inc. (Hwaseong-si, South Korea).

"Overlay measurement apparatus and overlay measurement method" was invented by Ji Hoon Kang (Osan-si, South Korea) and Ji Yun Jung (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "An overlay measurement apparatus includes: a light source unit configured to direct an illumination to an overlay measurement target in which a first filling unit formed in a first layer and a second filling unit formed in a second layer; a lens unit having an objective lens and a lens focus actuator; a detection unit acquiring a focus image at the measurement positi...