US Patent Issued to Aura Material on June 2 for "Gas storage structure and gas storage device" (Taiwanese Inventors)

ALEXANDRIA, Va., June 2 -- United States Patent no. 12,644,566, issued on June 2, was assigned to Aura Material Inc. (Hsinchu County, Taiwan).

"Gas storage structure and gas storage device" was invented by Chin-Chih Tai (Hsinchu County, Taiwan), Hsin Hung Pan (Yilan County, Taiwan) and Fang Ching Chang (Tainan City, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A gas storage structure includes at least one tubular element. The at least one tubular element includes at least one channel and at least two gas storage layers. The at least two gas storage layers surround the at least one channel, wherein each of the at least two gas storage layers includes a plurality of pores, the at least two gas storage...